发明名称 METHOD FOR PRODUCING GROUP III NITRIDE CRYSTAL
摘要 <P>PROBLEM TO BE SOLVED: To provide a method and an apparatus for growing a group III nitride crystal capable of growing a group III nitride crystal which has a practical size for producing devices such as a high-performance light emitting diode and an LD, is inexpensive, and has high quality. <P>SOLUTION: A mixed melt 103 comprising Ga as a group III metal and Na as an alkali metal is received in a mixed melt holding container 102. When the purity of Na is 99%; the purity of Ga is 99.9999%; the purity of nitrogen gas is 99.999%; and the material of the mixed melt holding container 102 is a BN as a sintered compact, a solid substance 110 has a shape with a hole 111 perforated in a part thereof. When nitrogen dissolves into the mixed melt 103 through the hole 111, a single crystal 109 of GaN as a group III nitride can be grown in the mixed melt 103. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009040683(A) 申请公布日期 2009.02.26
申请号 JP20080247344 申请日期 2008.09.26
申请人 RICOH CO LTD 发明人 SARAYAMA SHOJI;YAMANE HISANORI;SHIMADA MASAHIKO
分类号 C30B29/38;C30B19/02;H01L33/32;H01S5/323 主分类号 C30B29/38
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