| 摘要 |
<p>A method for performing the model-based scanner tuning is provided to optimize the OPE matching and the imaging performance between different lithography systems. A test pattern and an imaging model are defined(10). The test pattern is imaged by using the standards lithography system and imaging results are measured(20). The test pattern is imaged by using the first lithography system and imaging results are measured. An imaging model is calibrated(30) by using imaging results corresponding to the standards lithography system. The calibrated imaging model has the first set of the parametric values. The calibrated imaging model is tuned(40) by using the imaging results corresponding to the first lithography system. The tuned and calibrated models have the second set of the parametric values.</p> |
