发明名称 PATTERN MEASURING DEVICE
摘要 PROBLEM TO BE SOLVED: To attain measurements compatibly with high magnification and in a wide area as one of principal purposes. SOLUTION: As an embodiment of attainment of the purpose, provided is a pattern measuring device which adds identification information for discrimination from other pieces to each of pieces constituting a pattern in an image obtained by an SEM and stores the image in a predetermined storage format. Configurations like this facilitate management of the SEM image based upon the identification information since the identification information is added to each piece of the SEM image originally having no characteristic identification information. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009043937(A) 申请公布日期 2009.02.26
申请号 JP20070207344 申请日期 2007.08.09
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 MATSUOKA RYOICHI;ONIZAWA AKIHIRO;SUGIYAMA AKIYUKI;MOROKUMA HIDETOSHI;TOYODA YASUTAKA
分类号 H01L21/66;H01J37/28 主分类号 H01L21/66
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