A radiation source comprising a chamber and a supply of a plasma generating substance, the source having an interaction point at which the plasma generating substance introduced into the chamber may interact with a laser beam and thereby produce a radiation emitting plasma, wherein the source further comprises a conduit arranged to deliver a buffer gas into the chamber, the conduit having an outlet which is adjacent to the interaction point.
申请公布号
WO2009024860(A2)
申请公布日期
2009.02.26
申请号
WO2008IB02201
申请日期
2008.08.20
申请人
ASML NETHERLANDS B.V.;BANINE, VADIM YEVGENYEVICH;IVANOV, VLADIMIR VITALEVICH
发明人
BANINE, VADIM YEVGENYEVICH;IVANOV, VLADIMIR VITALEVICH