发明名称 RADIATION SOURCE
摘要 A radiation source comprising a chamber and a supply of a plasma generating substance, the source having an interaction point at which the plasma generating substance introduced into the chamber may interact with a laser beam and thereby produce a radiation emitting plasma, wherein the source further comprises a conduit arranged to deliver a buffer gas into the chamber, the conduit having an outlet which is adjacent to the interaction point.
申请公布号 WO2009024860(A2) 申请公布日期 2009.02.26
申请号 WO2008IB02201 申请日期 2008.08.20
申请人 ASML NETHERLANDS B.V.;BANINE, VADIM YEVGENYEVICH;IVANOV, VLADIMIR VITALEVICH 发明人 BANINE, VADIM YEVGENYEVICH;IVANOV, VLADIMIR VITALEVICH
分类号 H05G2/00 主分类号 H05G2/00
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