| 摘要 |
A two-fluid jet nozzle for cleaning a substrate is provided to improve the wafer cleaning efficiency by mixing the washing solution and the dry air. The first receptacle(100) and the second receptor(200) accommodate the different fluid. The first path(110) transfers the first fluid adopted to the first receptacle. The first opening(111) in which the first fluid is emitted is formed at the end part of the first path. The second path(210) transfers the second fluid adopted to the second receptor. The second opening(211) in which the second fluid is emitted is formed at the end part of the second path. A two-fluid jet unit(400) mixes the driven fluid sprayed from the first opening and the second opening. A guide unit(212) is formed at the tip-end part of the second opening and induces the spray direction of the second fluid emitted from the second opening to the first opening.
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