| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an interpenetrating polymer network structure having the surface hardly allowing a solute component and a suspended matter in a slurry to be attached or accumulated, to provide a polishing pad having high polishing rate, reduced dishing and elongated pad life, and to provide a method for producing the interpenetrating polymer network structure. <P>SOLUTION: (1) The interpenetrating polymer network structure is obtained by radically copolymerizing a silane compound having an alkoxy group and/or a chloro group and a radically reactive group. (2) The polishing pad comprises the interpenetrating polymer network structure of (1). <P>COPYRIGHT: (C)2009,JPO&INPIT |
