| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new compound useful as an acid-generating agent used for a resist composition, a method for producing the same, a compound useful as a precursor of the above compound, a method for producing the same, an acid-developing agent, a resist composition and a method for forming a resist pattern. <P>SOLUTION: The compound is expressed by general formula (b1-1) [wherein, A is a divalent group forming a 3 to 7-membered ring-structured ring together with an S atom bonded with the A, and the ring may have a substituent; R<SP>2</SP>is an aromatic group which may have a substituent, a 1-10C linear or branched alkyl which may have a substituent or a 2-10C linear or branched alkenyl which may have a substituent; (n) is 0 or 1; and Y<SP>1</SP>is a 1-4C alkylene which may be substituted with F]. <P>COPYRIGHT: (C)2009,JPO&INPIT |
