发明名称 |
METHOD FOR DETERMINING THE POSITION OF A MEASUREMENT OBJECTIVE IN THE Z-COORDINATE DIRECTION OF AN OPTICAL MEASURING MACHINE HAVING MAXIMUM REPRODUCIBILITY OF MEASURED STRUCTURE WIDTHS |
摘要 |
A method for determining the ideal focus position on different substrates is disclosed. A focus criterion is determined with which the best reproducibility may be achieved. An offset permits the user to set the optimal operating point of the coordinate measuring machine for a reproducible measurement of dimensions of structures on a substrate.
|
申请公布号 |
US2009051932(A1) |
申请公布日期 |
2009.02.26 |
申请号 |
US20080193095 |
申请日期 |
2008.08.18 |
申请人 |
VISTEC SEMICONDUCTOR SYSTEMS GMBH |
发明人 |
HEIDEN MICHAEL;RINN KLAUS |
分类号 |
G01B11/14 |
主分类号 |
G01B11/14 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|