发明名称 METHOD FOR DETERMINING THE POSITION OF A MEASUREMENT OBJECTIVE IN THE Z-COORDINATE DIRECTION OF AN OPTICAL MEASURING MACHINE HAVING MAXIMUM REPRODUCIBILITY OF MEASURED STRUCTURE WIDTHS
摘要 A method for determining the ideal focus position on different substrates is disclosed. A focus criterion is determined with which the best reproducibility may be achieved. An offset permits the user to set the optimal operating point of the coordinate measuring machine for a reproducible measurement of dimensions of structures on a substrate.
申请公布号 US2009051932(A1) 申请公布日期 2009.02.26
申请号 US20080193095 申请日期 2008.08.18
申请人 VISTEC SEMICONDUCTOR SYSTEMS GMBH 发明人 HEIDEN MICHAEL;RINN KLAUS
分类号 G01B11/14 主分类号 G01B11/14
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