| 摘要 |
PROBLEM TO BE SOLVED: To provide a molecular beam source cell, wherein the uniformity of the film thickness of a thin film deposited on a substrate is improved at a low cost only by adding an extremely inexpensive member, and further, which is usable not only for the vapor deposition of an organic material but also for the vapor deposition of an inorganic material requiring a high temperature stage. SOLUTION: The molecular beam source cell includes: a crucible 1 having an opening part 1a confronted with the substrate to be vapor-deposited; and a heater heating and evaporating a molecular beam material filled into the crucible 1 and releasing the molecular beam from the opening part 1a. A cap 2 is arranged at the opening part 1a of the crucible 1, the cap 2 is formed in such a manner that the whole thereof has a thickness of≥6 mm in the direction of the central axis A of the opening part 1a, and also, at the inside thereof, a plurality of restrictions 2a elongating almost from the center of the bottom part 2c of the cap to the outer circumference of the opening part 1a of the crucible 1 or to the vicinity thereof, and tilted within the range of about 15 to 60 degrees to the central axis A of the opening part 1a are almost radially formed. COPYRIGHT: (C)2009,JPO&INPIT
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