摘要 |
A lithographic apparatus is disclosed including a liquid supply system configured to at least partly fill a space (10) between the projection system (PL) and the substrate (W) with a liquid (11), an outlet configured to remove a mixture of liquid and gas passing through a gap (28) between a liquid confinement structure (12) of the liquid supply system and the substrate, and an evacuation system (30) configured to draw the mixture through the outlet (14), the evacuation system having a separator tank (35) arranged to separate liquid from gas in the mixture and a separator tank pressure controller (40), connected to a non-liquid-filled region of the separator tank, configured to maintain a stable pressure within the non-liquid-filled region. |
申请人 |
ASML NETHERLANDS B.V. |
发明人 |
MERTENS, J.J.S.M.;DONDERS, S.N.L.;DE GRAAF, R.F.;HOOGENDAM, C.A.;VAN DER NET, A.J.;TEUNISSEN, F.J.H.M.;TINNEMANS, P.A.J.;VERHAGEN, M.C.M.;VERSPAY, J.J.L.H.;VAN GOMPEL, E.A.M. |