PHOTOMASK AND MANUFACTURING METHOD THEREOF

摘要

A manufacturing method of photomask and a photomask are provided to adjust the thickness of resist layer by using the gray tone mask. The resist layer which performs the exposure under the predetermined exposure condition by using photomask is formed on the work piece layer in which the etching processing is made. A light-shielding layer(6) and a half transparent layer are formed on a transparent substrate(1). The light-shielding layer, the half transparent layer and the transparent substrate are formed by patterning the light-shielding layer and the half transparent layer. The half transparent layer has different membrane permeability of the exposure light according to the location.