发明名称 |
Physical Vapor Deposition Targets Comprising Ti and Zr and Methods of Use |
摘要 |
The invention described herein relates to physical vapor deposition targets comprising both Ti and Zr. The targets can comprise a uniform texture across the target surface and throughout the thickness; and can further have an increased mechanical strength compared to high purity titanium and tantalum. The sputtering targets can be utilized to sputter deposit a thin film; and such thin film can be utilized as a copper barrier layer. |
申请公布号 |
US2009053540(A1) |
申请公布日期 |
2009.02.26 |
申请号 |
US20080059020 |
申请日期 |
2008.03.31 |
申请人 |
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发明人 |
TURNER STEPHEN P. |
分类号 |
B32B15/04;B32B9/04;C23C14/34;H01L21/314;H01L21/316 |
主分类号 |
B32B15/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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