| 摘要 |
PROBLEM TO BE SOLVED: To provide a film forming apparatus capable of effectively cleaning a film forming chamber even when a substrate size increases and a cleaning method thereof. SOLUTION: The film forming apparatus 10 is equipped with the film forming chamber 2 in which a substrate 20 is disposed, a substrate supporting section 15 installed inside the film forming chamber 2 and capable of loading the substrate 20, a shower plate 5 disposed opposite to the substrate supporting section 15 and having a plurality of small holes 6 to guide film forming gas into the film forming chamber 2, and a cleaning gas supply means for supplying activated cleaning gas to the film forming chamber 2 to remove deposits inside the film forming chamber 2. The cleaning gas supply means is equipped with a cleaning gas supply pipe 37 installed along the inside of the film forming chamber 2. In the cleaning method, the cleaning gas supply means supplies the cleaning gas from a plurality of gas exhaust nozzles 39 formed in the cleaning gas supply pipe 37 to a space between the shower plate 5 and the substrate supporting section 15, and supplies inert gas from the shower plate 5 toward the inside of the film forming chamber 2. COPYRIGHT: (C)2009,JPO&INPIT
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