发明名称 A BASE PLATE TRANSFER METHOD AND APPARATUS
摘要 <p>An apparatus for transferring substrate including first lift and second lift is provided to shorten transferring time, processing time, and latency time of a substrate by transferring a plurality of substrates with a first lift and a second lift by turns. A first top rotary supporting bar(131), a second top rotary supporting bar(231), a first bottom rotary supporting bar(132), and a second bottom rotary supporting bar(232) are rotated in separated state. A first lift(100) and a second lift(200) are lifted between a first position and a second position by turns. A plurality of substrates(400) is transferred by the first lift and the second lift. Latency time of the substrate in the first rotary supporting bar and the second rotary supporting bar is shortened. The first top rotary supporting bar, the second top rotary supporting bar, the first bottom rotary supporting bar, and the second bottom rotary supporting bar are rotated by a first to a fourth rotary axis and a first to a fourth belt member.</p>
申请公布号 KR100885877(B1) 申请公布日期 2009.02.26
申请号 KR20080067805 申请日期 2008.07.11
申请人 INATECH CO., LTD. 发明人 SHIN, DONG HYUK
分类号 H01L21/68;H01L21/677 主分类号 H01L21/68
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