Lithographic apparatus, analyser plate and method of measuring a parameter of a projection system,申请号EP20050111692-传众专利搜索

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发明名称	Lithographic apparatus, analyser plate and method of measuring a parameter of a projection system
摘要
申请公布号	EP1672430(B1)	申请公布日期	2009.02.25
申请号	EP20050111692	申请日期	2005.12.05
申请人	ASML NETHERLANDS B.V.	发明人	SENGERS, TIMOTHEUS FRANCISCUS;VAN DE KERKHOF, MARCUS ADRIANUS
分类号	G03F7/20	主分类号	G03F7/20
代理机构		代理人
主权项
地址

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