A METHOD FOR FORMATION OF A GLASS FILM FOR SURFACE PROTECTION

摘要

A silica glass film formation method for passivating surface using polysilazane is provided to have no deformity by impurity when cured in a room temperature and to form glass film having high density. A glass film formation method for passivating surface comprises steps of: coating polysilazane on a substrate; and curing the polysilazane by using atmospheric pressure plasma process. A process time of the curing step is 10-20 minutes. A processing temperature of the curing step is 50~120°C. A process gas of the atmospheric pressure plasma process is argon gas and oxygen gas.