发明名称 DEVICE AND METHOD FOR REGENERATING ETCHING LIQUID
摘要 A device for regenerating etching liquid and a regenerating method thereof are provided to reduce down-time of the etching device maximumly by circulating the regenerated etching liquid. A device for regenerating etching liquid includes the followings. A temperature control unit(11) controls temperature of the extracted spent etching liquid. A atomization unit(12) atomizes the controlled etching liquid. The eduction unit(13) educes silicide in the spent etching liquid. And a separation unit(14) gains regenerated etching liquid by separating the educed silicide.
申请公布号 KR20090019652(A) 申请公布日期 2009.02.25
申请号 KR20070104875 申请日期 2007.10.18
申请人 CHEMICAL ART TECHNOLOGY INC. 发明人 WATANABE HIROSHI
分类号 C23F1/46 主分类号 C23F1/46
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