| 摘要 |
<p>A layer (II) of transparent conductive oxide layer is generated by direct current sputtering of target containing zinc oxide and aluminum in oxygen atmosphere. The transparent conductive oxide layer has layer (I) having high conductivity and layer (II) having reduced electroconductivity. Thus, the transparent conductive oxide coating is manufactured. A layer (II) of transparent conductive oxide is generated by direct current sputtering of target containing zinc oxide and aluminum in oxygen atmosphere. The transparent conductive oxide layer has layer (I) having high conductivity and layer (II) having reduced electroconductivity. Thus, the transparent conductive oxide coating is manufactured. The process atmosphere further contains argon or other inert gas. The target further contains ceramic. The metal layer containing metal chosen from molybdenum, niobium, copper, nickel, silver and aluminum is formed on substrate. Layer containing copper indium diselenide, copper-gallium indium diselenide, copper-gallium selenide or copper-indium sulfide is formed on metal layer. Another layer containing cadmium-zinc sulfide, cadmium telluride, cadmium sulfide, zinc sulfide or magnesium-zinc oxide is formed on the substrate structure.</p> |
