SUBSTRATE WITH NANO STRUCTURE AND METHOD FOR MANUFACTURING THE SAME

摘要

A substrate having a nano structure is provided to perform a nano imprinting process two times, to reclaim metal islands of nano structure by masking protrusions made in each nano imprinting process and etching a metal layer and to form a nanostructure consisting of oxide film upside the substrate by masking the metal islands of the nano structure and etching the oxide film. A substrate having a nano structure contains a substrate(200) and a nanostructure consisting of oxide film(210) and formed in upper part of the substrate. A transverse section of the nanostructure is a rectangular shape. One inner angle(alpha) of the square is more than 0 and less than or equal to 90°.