发明名称 Semiconductor memory devices and methods for forming the same
摘要 A semiconductor memory device can include select transistors and cell transistors on a semiconductor substrate. An insulation layer covers the select transistors and the cell transistors. The bit lines are in the insulation layer and are electrically connected to respective ones of the select transistors. The bit lines are arranged along at least two different parallel planes having different heights relative to the semiconductor substrate.
申请公布号 US7494871(B2) 申请公布日期 2009.02.24
申请号 US20060647671 申请日期 2006.12.29
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE CHANG-SUB;CHOI JEONG-HYUK;LEE WOON-KYUNG;SONG JAI-HYUK;OH DONG-YEAN
分类号 H01L21/336 主分类号 H01L21/336
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