发明名称 Semiconductor optical devices and method for forming
摘要 A semiconductor optical device includes an insulating layer, a photoelectric region formed on the insulating layer, a first electrode having a first conductivity type formed on the insulating layer and contacting a first side of the photoelectric region, and a second electrode having a second conductivity type formed on the insulating layer and contacting a second side of the photoelectric region. The photoelectric region may include nanoclusters or porous silicon such that the device operates as a light emitting device. Alternatively, the photoelectric region may include an intrinsic semiconductor material such that the device operates as a light sensing device. The semiconductor optical device may be further characterized as a vertical optical device. In one embodiment, different types of optical devices, including light emitting and light sensing devices, may be integrated together. The optical devices may also be integrated with other types of semiconductor devices, such as vertical field-effect transistors.
申请公布号 US7494832(B2) 申请公布日期 2009.02.24
申请号 US20060465402 申请日期 2006.08.17
申请人 FREESCALE SEMICONDUCTOR, INC. 发明人 MATHEW LEO;DU YANG;THEAN VOON-YEW
分类号 H01L21/00;H01L21/44;H01L21/48;H01L21/50;H01L33/08;H01L33/18;H01L33/24;H01S5/026;H01S5/042;H01S5/22;H01S5/30 主分类号 H01L21/00
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