| 摘要 |
A cleaning composition comprises a first surfactant and a second surfactant. The first surfactant is of the general formula R1-O-(A)mH, wherein R1 is an aliphatic hydrocarbon having from 10 to 16 carbon atoms, A is an alkyleneoxy group, and subscript m is a positive number. The second surfactant is of the general formula R2 -O-(B)nH, wherein R2 is an aliphatic hydrocarbon having from 12 to 15 carbon atoms, B is an alkyleneoxy group, and subscript n is a positive number. The cleaning composition has an average degree of alkoxylation of from about 3 to about 8 moles and an excess of the first surfactant relative to said second surfactant. The cleaning composition can further comprise a third surfactant in addition to the first and second surfactants. If employed, the third surfactant typically can comprise a linear alkyl sulfonate (LAS) and/or an alkyl ether sulfate (AES).
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