发明名称 STRUCTURE AND METHOD FOR FORMING A SHIELDED GATE TRENCH FET WITH THE SHIELD AND GATE ELECTRODES BEING CONNECTED TOGETHER
摘要 <p>A field effect transistor (FET) includes a plurality of trenches extending into a semiconductor region. Each trench includes a gate electrode and a shield electrode with an inter-electrode dielectric therebetween, wherein the shield electrode and the gate electrode are electrically connected together.</p>
申请公布号 KR20090018638(A) 申请公布日期 2009.02.20
申请号 KR20087030499 申请日期 2007.05.21
申请人 FAIRCHILD SEMICONDUCTOR CORPORATION 发明人 KRAFT NATHAN;KOCON CHRISTOPHER BOGUSLAW;THORUP PAUL
分类号 H01L29/78;H01L21/336 主分类号 H01L29/78
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