| 摘要 |
PROBLEM TO BE SOLVED: To provide a method of manufacturing a phase type diffraction grating and an amplitude type diffraction grating constituting an X-ray Talbot interferometer. SOLUTION: This phase type diffraction grating and amplitude type diffraction grating manufacturing method first forms a metal seed layer 41 on the surface of a glass substrate B, and forms an ultraviolet sensitive photopolymer 31 on the surface of the metal seed layer 41, then carries out patterning on the ultraviolet sensitive photopolymer 31 formed on the surface of the metal seed layer 41 using an optical lithography mask 34 by an optical lithography method, and removes the non-exposed ultraviolet sensitive photopolymer 31 by developing. Further, it forms an X-ray absorption metal section by applying a voltage to the metal seed layer 41 by the electroforming method in the area where the non-exposed ultraviolet sensitive photopolymer 31 has been removed, then removes the ultraviolet sensitive photopolymer 31 and the metal seed layers 41 corresponding to the areas other than the area where the X-ray absorption metal section was formed. COPYRIGHT: (C)2009,JPO&INPIT |
