发明名称 FIELD EFFECT TRANSISTOR WITH GATE INSULATION LAYER FORMED BY USING AMORPHOUS OXIDE FILM
摘要 A field effect transistor includes a channel layer 11, a source electrode 13, a drain electrode 14, a gate insulation layer 12 and a gate electrode 15 formed on a substrate 10. The channel layer is made of an amorphous oxide and that the gate insulation layer is made of an amorphous oxide containing Y.
申请公布号 US2009045399(A1) 申请公布日期 2009.02.19
申请号 US20070282841 申请日期 2007.03.17
申请人 CANON KABUSHIKI KAISHA 发明人 KAJI NOBUYUKI;YABUTA HISATO
分类号 H01L29/22 主分类号 H01L29/22
代理机构 代理人
主权项
地址