| 摘要 |
A remote plasma system and method therefore are provided to check the efficiency of the remote plasma processing by continuously monitoring the remote plasma in a series of process. The remote plasma is generated in the remote plasma reactor. The remote plasma generated in the remote plasma reactor is supplied to the process chamber. By using the remote plasma flowed into the inside of the processing chamber, the plasma process is performed. The remote plasma state is monitored and then the remote plasma is diagnosed. In a step(S171) for monitoring remote plasma state, the intensity of the remote plasma light is measured. The diagnosis result of the remote plasma relates to one or more process control.
|
