| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an acrylic copolymer having a specific structure and a radiation-sensitive resin composition comprising the acrylic copolymer having high transparency to radiation and excelling in basic properties as a resist material such as sensitivity, resolution, dry etching resistance and pattern shape. <P>SOLUTION: The acrylic copolymer comprises the recurring units shown by formulae (4-1), (4-2) and (4-3). The radiation-sensitive resin composition comprises the acrylic copolymer. <P>COPYRIGHT: (C)2009,JPO&INPIT |
