发明名称 OPTICAL SYSTEM, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD
摘要 <P>PROBLEM TO BE SOLVED: To provide technique for adjusting distortion and/or astigmatic difference with high precision. <P>SOLUTION: An optical system includes at least one first refractive optical member nearby an object surface and at least one second refractive optical member nearby an image surface, and satisfies 0.4&le;¾&beta;¾&le;2.5, where &beta; is the imaging magnification of the image surface to the object surface. The optical system holds at least one of the first and second refractive optical members in a plane orthogonal to an optical-axis direction so as to be movable, and has an adjusting means of adjusting one of the astigmatic difference and distortion of the optical system. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009038152(A) 申请公布日期 2009.02.19
申请号 JP20070199894 申请日期 2007.07.31
申请人 CANON INC 发明人 WATANABE SHU
分类号 H01L21/027;G02B17/08;G03F7/20 主分类号 H01L21/027
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