| 摘要 |
It is intended to in a liquid-immersion exposure process, simultaneously prevent any degeneration, represented by bridge, etc., of resist film during the liquid-immersion exposure using water and other various liquid-immersion exposure liquids and any degeneration of liquid-immersion exposure liquids per se, and to without increasing of the number of treatment steps, realize enhancing of the post-exposure storage stability of resist film, and to enable forming of a resist pattern of high resolution through liquid-immersion exposure. Use is made of an acrylic copolymer of the general formula: wherein R is a hydrogen atom or methyl; R' is a hydrogen atom, methyl or C1-C4 hydroxyalkyl; R1 is a C1-C15 linear, branched or cyclic alkyl with the proviso that the hydrogen atoms of the alkyl may be partially or wholly substituted with fluorine atom or atoms; R2 is an alicyclic hydrocarbon group; R3 is a linear hydrocarbon group; and each of l, m, n and o is the mol % of structural unit contained, being in the range of 2 to 60 mol %.
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