| 摘要 |
<p>An arrangement for providing alignment between an optical nanotaper coupler and a free space optical signal includes the formation of a "ridge" structure around the location of the nanotaper coupler to reduce stray light-related errors in the alignment process. The ridge is preferably formed by etching vertical sidewalls through the inter-level dielectric (ILD) and buried oxide (BOX) layers of the SOI structure. When an optical source (such as an illuminated fiber, laser, etc.) is scanned across this etched arrangement, the signal received by an associated photodetector registers an increase at the boundary between the etched region and the vertical sidewall of the ridge, thus defining the bounds within which the nanotaper coupler is located. Since the dimensions of the ridge are known and controlled by the etching process, the location of the nanotaper coupler tip along the endface of the ridge can be determined from this scan.</p> |
