| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner capable of highly accurately positioning a fine adjustment stage in a vertical direction. <P>SOLUTION: The aligner is for transferring a pattern formed on an original to a substrate. The aligner includes a coarse adjustment stage 2, the fine adjustment stage 1, first members 7a and 7b provided with a first reflection surface 66 for reflecting measurement light, second members 8a and 8b provided with a second reflection surface for reflecting reference light, and interferometers 9a and 9b. The coarse adjustment stage 2 is movable at least in one axial direction on a horizontal plane, and the fine adjustment stage 1 is supported on the coarse adjustment stage 2 and holds the substrate. The first members 7a and 7b are attached to the fine adjustment stage 1 and the second members 8a and 8b are attached to a reference structure 4. The interferometers 9a and 9b emit the measurement light and the reference light and measure the position in the vertical direction of the fine adjustment stage 1 using the measurement light reflected on the first reflection surface 66 and the reference light reflected on the second reflection surface. The first members 7s and 7b are attached to one surface of the fine adjustment stage 1 so that the first reflection surface and one of the upper surface and lower surface of the fine adjustment stage 1 are flat. <P>COPYRIGHT: (C)2009,JPO&INPIT |
