发明名称 Method for Radiation Tolerance by Implant Well Notching
摘要 A logic book for a programmable device such as an application-specific integrated circuit (ASIC) achieves improved radiation tolerance by providing notches in an implant well between adjacent transistors and fills the notches with complementary well regions that act as a barrier to charge migration. For example, a row of n-type field effect transistors (NFETs) is located in a Pwell region, while a row of p-type transistors is located in an Nwell region with portions of the Nwell region extending between the NFETs. More complicated embodiments of the present invention include embedded well islands to provide barriers for adjacent transistors in both rows of the book.
申请公布号 US2009045841(A1) 申请公布日期 2009.02.19
申请号 US20070838286 申请日期 2007.08.14
申请人 BECKENBAUGH MARK R;KLEINOSOWSKI AJ;LUKES ERIC J 发明人 BECKENBAUGH MARK R.;KLEINOSOWSKI AJ;LUKES ERIC J.
分类号 H03K19/0948;G06F17/50;H01L27/092 主分类号 H03K19/0948
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