| 摘要 |
A method for obtaining a transparent conductive film comprises the steps of providing a transparent substrate, depositing a conductive film, of a thickness not greater than 5 mum, on the transparent substrate, and removing the entire thickness of conductive film from portions of the surface of the substrate in such a way that the residual parts of the conductive film on the substrate define a pattern formed by lines of a width of between 1 nm and 2 mum, with distances between the adjacent lines of between 10 nm and 2 mum, said pattern being predetermined in such a way as to obtain a ratio between full spaces and empty spaces corresponding to a desired degree of optical transmittance for the conductive film.
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