| 摘要 |
PROBLEM TO BE SOLVED: To prevent the situation that light does not easily enter a photoelectric conversion means because of diffraction or the like of the light and micronization, resulting in lower observation accuracy. SOLUTION: The solid-state imaging apparatus in one embodiment of this invention comprises: a photoelectric conversion part including a first photoelectric conversion means 3R, a second photoelectric conversion means 3G and a third photoelectric conversion means 3B formed on a substrate 2; a filter layer including a first filter layer 10R provided on the light incidence side of the first photoelectric conversion means 3R for separating first specified wavelength light from incident light, a second filter layer 10G provided on the light incidence side of the second photoelectric conversion means 3G for separating a second specified wavelength light from the incident light, and a third filter layer 10B provided on the light incidence side of the third photoelectric conversion means 3B for separating a third specified wavelength light from the incident light; and a wavelength conversion layer 12 provided between the photoelectric conversion part and the filter layers and for shortening the wavelength of the first specified wavelength light, the second specified wavelength light and the third specified wavelength light from the filter layer side to the photoelectric conversion part side. COPYRIGHT: (C)2009,JPO&INPIT
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