发明名称 METHOD FOR MANUFACTURING LIQUID CRYSTAL DEVICE, AND LIQUID CRYSTAL DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for manufacturing a liquid crystal device of an FSS mode laminated with interlayer insulation film, pixel electrodes, interelectrode insulation film and a common electrode in this order, and to provide a configuration in which the shortcut and the disconnection at the inside of the contact hole and the opening edges of the liquid crystal device can be surely prevented. SOLUTION: On a device substrate 10 of the liquid crystal device 100, thin film transistor 30, the interlayer insulation films 4, 6, pixel electrode 7a electrically connected to the thin film transistor 30 via the contact hole 6a formed in the interlayer insulation film 6 and drain electrode 5b, and the interlayer insulation film 8a and a common electrode 9a formed with a plurality of slit-like apertures 9b are laminated. The contact hole 6a is embedded by the intra-hole insulation film 8b formed on the upper layer side of the pixel electrode 7a. The intra-hole insulation film 8b is the insulation film which is simultaneously formed with the interelectrode insulation film 8a and to which liquid object is applied and cured thereafter. The liquid object is composed of poly silazane dissolved in prescribed solvent and dispersed. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009036947(A) 申请公布日期 2009.02.19
申请号 JP20070200448 申请日期 2007.08.01
申请人 SEIKO EPSON CORP 发明人 MIYATA TAKASHI
分类号 G02F1/1368;H01L21/336;H01L29/417;H01L29/423;H01L29/49;H01L29/786 主分类号 G02F1/1368
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