| 摘要 |
PROBLEM TO BE SOLVED: To provide a composite charged particle beam device, in which a sample can be observed without being contaminated during a process. SOLUTION: The composite charged particle beam device is provided with an ion beam radiation system 20 provided with a gas field ion source, an electron beam radiation system 50 of which radiation axis is disposed at 90 deg. or a smaller angle than 90 deg. to the radiation axis of the ion beam radiation system 20, a sample table 14 to support the sample at a crossing position of the ion beam 20A outputted from the ion beam radiation system 20 with the electron beam 50A outputted from the electron beam radiation system 50, and a gas gun 11 to supply function gas for deposition or etching the beam radiation position on the sample. COPYRIGHT: (C)2009,JPO&INPIT |
