Dummy pattern placement apparatus, method and program and semiconductor device

摘要

The load of OPC processing (especially, the load of bias processing) has been increasing due to optical effects involved in the placement of a dummy pattern. A pattern placement apparatus places dummy patterns in a layout region where a plurality of wiring patterns is placed. The pattern placement apparatus comprises: a placement region setting section that sets a placement region, where each of the dummy patterns should be placed, in an intermediate region between the adjacent wiring patterns at substantially constant intervals to the adjacent writing patterns; and a pattern placement section that places the dummy pattern in the placement region.