摘要 |
<p>A method and apparatus for reducing the pulse-to-pulse laser energy variation (i.e., increasing the pulse-to-pulse laser energy repeatability) from a pulsed laser source are provided. In this manner, laser pulses impingent on a processing plane, such as the surface of a wafer or other substrate, may have substantially the same energy content leading to a more controlled process when compared to conventional processing. The method may be based on in-situ detection of the pulse energy level and the subsequent active adjustment of the transmitted laser pulse energy in a closed-loop control scheme. Furthermore, the active adjustment of the laser pulse energy may occur within a few nanoseconds after the original laser pulse is generated by a pulsed laser source.</p> |
申请人 |
APPLIED MATERIALS, INC.;LI, JIPING;HUNTER, AARON MUIR;THOMAS, TIMOTHY N.;JENNINGS, DEAN;ADAMS, BRUCE E. |
发明人 |
LI, JIPING;HUNTER, AARON MUIR;THOMAS, TIMOTHY N.;JENNINGS, DEAN;ADAMS, BRUCE E. |