发明名称 LASER LIGHT SOURCE AND EXPOSURE METHOD
摘要 <P>PROBLEM TO BE SOLVED: To achieve stable exposure control in an exposure apparatus having a plurality of oscillation modes which can be selectively switched. <P>SOLUTION: A laser light source has the plurality of oscillation modes which can be selectively switched, oscillates laser beam on an oscillation condition corresponding to each oscillation mode and includes an oscillator for oscillating laser beam and a control means which has control data for controlling the oscillation of laser beam for each oscillation mode and controls the oscillation of laser beam from the oscillator on the basis of control data corresponding to a selected oscillation mode out of the plurality of oscillation modes. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009038383(A) 申请公布日期 2009.02.19
申请号 JP20080229902 申请日期 2008.09.08
申请人 NIKON CORP 发明人 NISHINAGA HISASHI
分类号 H01L21/027;G03F7/20;H01S3/10;H01S3/225 主分类号 H01L21/027
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