| 摘要 |
The present invention provides a nano silicon dioxide abradant polishing liquid for processing microcrystal glass, which contains abradant I, abradant II, surfactant, pH regulator and deionized water; and the weight percentages of the components are following: 10wt%-40wt% of abradant I, 5wt%-20wt% of abradant II, 1wt%-6wt% of pH regulator, 0.01wt%-0.6wt% of surfactant and the balance of deionized water; the pH of the mixed solution of the aforementioned each component is 10-11; in which the abradant I is silicon dioxide colloidal solution having a particle size of 0.1-200nm, the concentration of the above solution is 10% to 40%; the abradant II is silicon dioxide powder having a particle size of 0.1-200nm. |
