发明名称 NEGATIVE PHOTOSENSITIVE COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a new negative photosensitive composition which requires neither burning nor overcoating before exposure and has excellent sensitivity, adhesion and storage stability. <P>SOLUTION: The negative photosensitive composition comprises (A) one or more amines selected from the group consisting of amino alcohols, derivatives thereof and cyclic amines, (B) a polymer having a carboxyl group and also having an ethylenically unsaturated bond, (C) an organoboron compound, (D) a near-infrared absorbing dye, (E) a monomer having at least one ethylenically unsaturated bond, and (F) a sulfonyl compound. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009037177(A) 申请公布日期 2009.02.19
申请号 JP20070215078 申请日期 2007.08.21
申请人 THINK LABORATORY CO LTD 发明人 SATO TSUTOMU;HATAKEYAMA HARUO;SUGAWARA SHINTARO
分类号 G03F7/004;G03F7/038;H01L21/027 主分类号 G03F7/004
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