发明名称 PHOTOSENSITIVE RESIN COMPOSITION
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition for forming a liquid crystal molecular orientation controlling projection or forming a spacer, having a good shape and giving a pattern with good surface smoothness. <P>SOLUTION: This photosensitive resin composition contains a binder resin (A), a quinonediazide compound, and a solvent. (A) reacts (A3) with copolymers of (A1)-(A4) or copolymers 1 of (A1), (A2), (A4) at a portion of an epoxy group originating from (A4) and contains at least one of the copolymers made by reacting (A5) at a portion of a hydroxyl group originating from the reaction of (A4) and (A3). (A1); Compound having one or more of a tricyclodecane skeleton and a dicyclopentadiene skeleton and an unsaturated bond, (A2); Compound containing an unsaturated bond which is copolymerizable with (A1) and (A4), (A3); Unsaturated bond-containing carboxylic acid; (A4); Unsaturated bonding and epoxy group-containing compound; (A5); Acid anhydride. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009036954(A) 申请公布日期 2009.02.19
申请号 JP20070200551 申请日期 2007.08.01
申请人 SUMITOMO CHEMICAL CO LTD 发明人 KOYAMA YOSHINORI
分类号 G03F7/023;C08F8/14;C08F220/28;C08F299/00;G02B5/20 主分类号 G03F7/023
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