| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an alkali-developable photosensitive resin composition excellent in sensitivity and adhesion and capable of accurately forming a fine pattern regardless of whether a photopolymerization initiator is not used or is used in small quantity. <P>SOLUTION: The alkali-developable photosensitive resin composition contains a photopolymerizable unsaturated compound having a structure obtained by esterification reaction of: hydroxyl groups of a reaction product obtained by adding a compound having a β-diketone moiety or a compound having a β-ketoester group to (meth)acryloyl groups of a compound having two or more (meth)acryloyl groups and hydroxyl group; and a polybasic acid anhydride. <P>COPYRIGHT: (C)2009,JPO&INPIT |
