A soft recovery diode is provided with an n+ type semiconductor substrate (2); an n-- type base layer (3) formed on the n+ type semiconductor substrate (2); an n- type base layer (4) formed on the n-- type base layer (3); and a p+ type anode layer (5) formed on the n- type base layer (4). The n-- type base layer (3) has an n type impurity at a concentration lower than that in the n- type base layer (4). A pn junction is formed by the p+ type anode layer (5) and the n- type base layer (4). An anode electrode (6) is formed on the p+ type anode layer (5), and a cathode electrode (7) is formed on the lower side of the n+ type semiconductor substrate (2).
申请公布号
WO2009022592(A1)
申请公布日期
2009.02.19
申请号
WO2008JP64097
申请日期
2008.08.06
申请人
THE KANSAI ELECTRIC POWER CO., INC.;MIYANAGI, YOICHI;SUGAWARA, YOSHITAKA