发明名称 |
CONTAMINANT REMOVING APPARATUS, CONTAMINANT REMOVING MECHANISM AND VACUUM THIN-FILM FORMATION WORKING DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To provide a contaminant removing method and the like by which a film (contaminant) deposited on a rear side end portion or a side surface of a substrate to be treated is removed. SOLUTION: A contaminant removing method of the present invention includes irradiating a rear side end portion and a side surface of a substrate 7 to be treated with a thin-film formed on the surface thereof with directional beams under vacuum. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009038295(A) |
申请公布日期 |
2009.02.19 |
申请号 |
JP20070203054 |
申请日期 |
2007.08.03 |
申请人 |
CANON ANELVA CORP |
发明人 |
TSUNEKAWA KOJI |
分类号 |
H01L21/304;B08B7/00;C23C14/58;C23C16/56;H01L21/302 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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