发明名称 Processes and equipments for preparing F2-containing gases, as well as process and equipments for modifying the surfaces of articles
摘要 The present invention provides processes and equipments for safely and easily preparing an F2-containing gas, as well as processes and equipments for surface modification using the F2-containing gas prepared. According to the present invention, a gas containing a fluoro compound that is easier to handle than F2 is supplied and the fluoro compound is excited and decomposed to convert it into F2 gas before surface modification and then used for surface modification. According to the present invention, there is no necessity of providing, storing and transporting a large amount of F2 gas in advance because a necessary amount of F2 gas is obtained immediately before surface modification. A process for preparing an F2-containing gas comprises the steps of exciting at least one fluoro compound in a fluoro compound-containing gas by conferring energy on the fluoro compound-containing gas under reduced pressure; and partially or completely converting the excited fluoro compound-containing gas containing the excited fluoro compound into F2 under normal pressure or overpressure.
申请公布号 US2009047792(A1) 申请公布日期 2009.02.19
申请号 US20050585878 申请日期 2005.03.30
申请人 TANIOKA TAKASHI;FUKAE KATSUYA;YONEMURA TAISUKE 发明人 TANIOKA TAKASHI;FUKAE KATSUYA;YONEMURA TAISUKE
分类号 C01B7/20;B01J19/08;C08J7/00;C23C8/08;H01L21/306;H01L21/461 主分类号 C01B7/20
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