| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure equipment for improving the array accuracy of shots. <P>SOLUTION: The exposure equipment for exposing a substrate 2 through a mask 1 respectively exposes a plurality of shot areas having superimposition areas through the mask 1 having measurement marks mp1, mp2, mp3, mp4, mp5, mp6, mp7 and mp8, measures a position deviation amount between measurement mark pairs formed in the respective superimposition areas by the exposure, and obtains the respective array errors of the plurality of shots (i, j), (i, j+1) and (i+1, j) using the least-squares method from the data of the position deviation obtained regarding the respective superimposition areas. <P>COPYRIGHT: (C)2009,JPO&INPIT |
