发明名称 |
SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD |
摘要 |
PROBLEM TO BE SOLVED: To provide a semiconductor device provided with an active layer or a light receiving layer including N and a semiconductor layer including P, and to provide a manufacturing method of the semiconductor device on a mass production basis. SOLUTION: The manufacturing method comprises a process of growing a group III-V compound semiconductor layer including nitrogen on a substrate by an MBE method and a process of growing the group III-V compound semiconductor layer including phosphor on the nitrogen-containing semiconductor layer by a chloride vapor growth method. COPYRIGHT: (C)2009,JPO&INPIT
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申请公布号 |
JP2009038245(A) |
申请公布日期 |
2009.02.19 |
申请号 |
JP20070202019 |
申请日期 |
2007.08.02 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
INOGUCHI YASUHIRO |
分类号 |
H01L21/20;H01L31/10;H01S5/343 |
主分类号 |
H01L21/20 |
代理机构 |
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代理人 |
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地址 |
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