发明名称 SEMICONDUCTOR DEVICE AND ITS MANUFACTURING METHOD
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device provided with an active layer or a light receiving layer including N and a semiconductor layer including P, and to provide a manufacturing method of the semiconductor device on a mass production basis. SOLUTION: The manufacturing method comprises a process of growing a group III-V compound semiconductor layer including nitrogen on a substrate by an MBE method and a process of growing the group III-V compound semiconductor layer including phosphor on the nitrogen-containing semiconductor layer by a chloride vapor growth method. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009038245(A) 申请公布日期 2009.02.19
申请号 JP20070202019 申请日期 2007.08.02
申请人 SUMITOMO ELECTRIC IND LTD 发明人 INOGUCHI YASUHIRO
分类号 H01L21/20;H01L31/10;H01S5/343 主分类号 H01L21/20
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