发明名称 NITRIDE SEMICONDUCTOR TRANSISTOR AND MANUFACTURING METHOD THEREOF
摘要 PROBLEM TO BE SOLVED: To provide a normally off type nitride semiconductor transistor while suppressing a current collapse. SOLUTION: The semiconductor transistor has a substrate 501, a buffer layer 502, a first nitride semiconductor layer 503, a second nitride semiconductor layer 504, a p-type nitride semiconductor layer 506, a source electrode 508, a drain electrode 509 and a gate electrode 510. A dopant layer 51 containing a p-type dopant is formed at a part of the second nitride semiconductor layer 504 disposed below the p-type nitride semiconductor layer 506. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009038175(A) 申请公布日期 2009.02.19
申请号 JP20070200464 申请日期 2007.08.01
申请人 PANASONIC CORP 发明人 KAIHARA KAZUHIRO;HIKITA MASAHIRO;UEDA TETSUZO;YANAGIHARA MANABU;UEMOTO YASUHIRO;TANAKA TAKESHI;UEDA DAISUKE
分类号 H01L21/338;H01L29/778;H01L29/812 主分类号 H01L21/338
代理机构 代理人
主权项
地址
您可能感兴趣的专利