| 摘要 |
PROBLEM TO BE SOLVED: To measure nano-scale roughness of an interference of a transparent film formed on a substrate, optically and nondestructively in a noncontact state. SOLUTION: A roughness measuring device 100 for measuring root mean square roughness of the interference of the transparent film 42 formed on the substrate 41 includes a light source 11 for irradiating light of the first wavelength having coherence to a transparent film formation surface of a substrate 41 on which the transparent film is formed and a reference mirror 19; a photodetector 23 for receiving interference light formed by synthesizing measuring light reflected by the transparent film formation surface with reference light reflected by a reference plane; and a roughness calculation part 33 for calculating root mean square roughness of the transparent film formation surface from a phase difference between the measuring light and the reference light based on an intensity change of the interference light received by the photodetector 23, and determining the root mean square roughness of the interference of the transparent film 42. COPYRIGHT: (C)2009,JPO&INPIT
|
